Micro / Nano imprint Applications

Micro/Nano imprint solution

With all the electronic products getting smaller, thinner than ever, micro/nano imprint process becomes one of the solutions for breaking the limitation of traditional photo lithography process. By using silicone material as a soft mold, it can simply complete the XYZ dimension pattern structure from metal or glass mother mold and imprint UV or thermal material to finish duplicating pattern.

Comparing to traditional photo lithography process, the equipment and production cost is much lower. It can easily making 3D structure pattern, and also using polymer UV or thermal material to imprint the pattern can save much more time for etching process from photo lithography.

Micro/Nano imprint solution can wildly apply to high aspect ratio pattern, anti-reflection moth-eye structure, bio-chip, LED patterned sapphire, Micro lens, solar cell patterning, also for gravure offset, metal mesh process from touch panel industry. 

Topco provides ShinEtsu PDMS “KE-106/SIM-360/X-34-4184” and LIMS “KET-3008” silicone material for pouring or injection process. It holds excellent releasing property, flexibility, optical transparency, permeability to gas and air.

As for UV imprint material, we provide UV resin for Daicel Corporation. It has excellent optical transparency, low curing energy and adjustable index of refraction “HRF series” and etching rate “CELVENUS PUR series” to sapphire.